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Latest News
Takumi Technology Granted Patent on Effective Proximity Effect Correction Methodology
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Takumi Technology Granted a Patent on System for Simplifying Layout Processing
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Takumi Technology released a paper at SPIE Advanced Lithography
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Takumi Technology released two papers at SPIE Photomask BACUS
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Takumi Expands Its Layout Optimization Tools to Support Automated Enforcement of Recommended Rules
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Takumi Technology Joins Si2’s Design-For-Manufacturability Coalition
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